[1]
“Assessment Of Cl 2 /CHF 3 Mixture For Plasma Etching Process On Barc And Tin Layer For 0.21 µm Metal Line: Silterra Case Study”, TURCOMAT, vol. 12, no. 4, pp. 231–239, Apr. 2021, Accessed: May 31, 2026. [Online]. Available: https://www.turcomat.org/index.php/turkbilmat/article/view/499