ET. AL., W. F. M.-H. Assessment Of Cl 2 /CHF 3 Mixture For Plasma Etching Process On Barc And Tin Layer For 0.21 µm Metal Line: Silterra Case Study. Turkish Journal of Computer and Mathematics Education (TURCOMAT), [S. l.], v. 12, n. 4, p. 231–239, 2021. Disponível em: https://www.turcomat.org/index.php/turkbilmat/article/view/499. Acesso em: 18 may. 2024.