et. al., W. F. M.-H. (2021). Assessment Of Cl 2 /CHF 3 Mixture For Plasma Etching Process On Barc And Tin Layer For 0.21 µm Metal Line: Silterra Case Study. Turkish Journal of Computer and Mathematics Education (TURCOMAT), 12(4), 231–239. Retrieved from https://www.turcomat.org/index.php/turkbilmat/article/view/499